Precise tailoring of evaporated gold nanocones using electron beam lithography and lift-off
نویسندگان
چکیده
منابع مشابه
Electron beam lithography on irregular surfaces using an evaporated resist.
An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces...
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ژورنال
عنوان ژورنال: Nanotechnology
سال: 2020
ISSN: 0957-4484,1361-6528
DOI: 10.1088/1361-6528/ab746e